Study on Gate-Controlled Electrical Conductivity and Field Emission Characteristics of Polycrystalline Silicon

Polycrystalline Silicon (poly-Si), known for its straightforward fabrication process and compatibility with integrated circuit (IC) technology, is utilized as the cathode material to construct planar electron tubes. This approach simplifies the device manufacturing process, reduces production costs, and holds potential for advancing the development of planar electron tube ICs. To explore the field emission properties and modulation mechanisms of planar electron tubes with poly-Si cathodes, this study first investigates the variation in electron density within poly-Si thin films under back-gate modulation by measuring the current passing through them. Additionally, the influence of the drain voltage on the modulation effect is examined. Based on these findings, the relationship between the field emission current of poly-Si cathodes and the back-gate modulation voltage is analyzed, demonstrating the ability to control the field emission current of poly-Si cathodes via the back-gate. A positive correlation is observed between the field emission current characteristics of poly-Si cathodes and their electron concentration. These results provide a foundation for the advancement of poly-Si-based planar electron tubes.